| The mask creates an interference pattern, exposing the photoresist in certain areas and leaving it unaffected in others. |
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| The use of the microtechnological photoresist as waveguide layer has made the researches mighty time-saving and economical. |
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| When exposed to light, the photoresist undergoes a chemical change that alters its solubility in a certain solvent. |
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| Consequently, we decided to maximize the thickness of photoresist films known to be free of these outgassing problems. |
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| The constantan was patterned using conventional photoresist. |
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| Casting is typically used to add a photosensitive polymer coating, called the photoresist layer. |
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| The cylinder is coated with a cold-top photoresist, as in letterpress engraving. |
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| The photoresist is deposited on the substrate using a spinner to obtain a layer about 1 µm thick. |
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| The researchers recorded the image onto a photoresist, a polymer coating on the other side of the superlens that becomes insoluble when exposed to UV light. |
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| An oxide layer is provided over a silicon substrate and a photoresist is applied and patterned to define areas where the signal line and the ground plane will be formed. |
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| Some polymers, such as most polyimides and polycarbonates, are not photosensitive and are typically processed using photoresist patterning and reactive ion etching. |
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| The surface of photoresist layer is expected to be round or curved because of its surface tension. |
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| Final photoresist formulations include the resin, photo acid generator, adhesion promoters, solvent blends for spinnability, and the resin. |
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| A method of patterning a TFE AF layer during integrated circuit fabrication using photoresist, comprising the step of adding a fluorosurfactant to the photoresist to increase adhesion of the photoresist to the TFE AF layer. |
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| Although photoresist is the basic recording material for photolithography and holography, it features low mechanical, chemical, thermal, and optical resistance. |
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| The holographic fabrication process shares certain similarities with photolithography in that both involve the recording of a surface-relief pattern on a photoresist layer. |
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